Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C
نویسندگان
چکیده
منابع مشابه
Multifunctional nanostructured Ti-Si-C thin films
In this Thesis, I have investigated multifunctional nanostructured Ti-Si-C thin films synthesized by magnetron sputtering in the substrate-temperature range from room temperature to 900 °C. The studies cover high-temperature growth of Ti3SiC2 and Ti4SiC3, low-temperature growth of Ti-Si-C nanocomposites, and Ti-Si-C-based multilayers, as well as their electrical, mechanical, and thermal-stabili...
متن کاملHigh-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target
We have deposited Ti-Si-C thin films using high-power impulse magnetron sputtering (HIPIMS) from a Ti3SiC2 compound target. The as-deposited films were composite materials with TiC as the main crystalline constituent. X-ray diffraction and photoelectron spectroscopy indicated that they also contained amorphous SiC, and for films deposited on inclined substrates, crystalline Ti5Si3Cx. The film m...
متن کاملTi3sic2formation during Ti–c–si Multilayer Deposition by Magnetron Sputtering at 650 °c Original Citation
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A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working g...
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ii The cover image is based on a photograph of arc spots moving on the surface of a Ti cathode, taken during the first experimental session in our new PVD research system, Hydra. The explosive plasma generation in the arc spots is central to the cathodic arc deposition technique, studied and used extensively for synthesis in the Thesis. Abstract This Thesis explores the arc deposition process a...
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تاریخ انتشار 2013